High Purity Titanium Target
Description:
The word "target" in "titanium sputtering target" comes from the
common shooting targets in our daily life. During the sputter
deposition process, the coating material is bombarded by an
electron beam or an ion beam, just like the target is shot, so the
material used in the sputtering process is named "sputter target".
Specifications:
| Product Name | titanium target |
| Purity | 99.99% |
| Delivery time | 7-15 days |
| Application | Used for coating |
Application:
Titanium sputtering targets have the same properties as their
source materials. High Purity Ti Target is widely distributed in
the earth's crust (about 0.4%). The world's titanium reserves are
approximately 3.4 billion tons, ranking 9th among all elements.
Titanium is a material with high commercial value. Due to its high
strength, good corrosion resistance, high heat resistance and other
advantages, it is widely used in daily life fields such as
aerospace, automobile manufacturing, medical and health care.
Purity: Purity has a great influence on the performance of films
produced by sputter coating. Taking Titanium alloy sputtering
target as an example, the higher the purity, the better the
corrosion resistance and electrical and optical properties of the
sputtered film.
Impurity content: Impurities in the target solid and oxygen and
water vapor in the pores are the main sources of pollution for
deposited films. Target materials for different uses have different
requirements for their impurity content.
Density: The density of the target not only affects the sputtering
rate, but also affects the electrical and optical properties of the
film. Therefore, in order to reduce the pores in the High Purity Ti
Target solid and improve the performance of the sputtered film, the
target material is usually required to have a higher density.
Preparation Of Titanium Alloy Sputtering Target
Titanium alloy sputtering target is a titanium product made of
titanium metal as raw material, used for sputtering coating to
produce titanium thin films. Simply put, there are two methods for
manufacturing titanium sputtering targets from titanium metal -
casting and powder metallurgy.
Casting: melt a certain proportion of raw materials, pour the alloy
solution into a mold to form an ingot, and finally machine it into
a sputtering target. The method is to smelt and cast in a vacuum.
Powder metallurgy: melt raw materials with a certain distribution
ratio, cast them into ingots and then crush them. The powder is
isostatically pressed and then sintered at high temperature to
finally form a target.
